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Author  |
Mata, R.; Cros, A.; Gimeno, B.; Raboso, D. |
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Title |
Secondary electron emission yield in thick dielectric materials: a comparison between Kelvin probe and capacitive methods |
Type |
Journal Article |
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Year |
2024 |
Publication |
Journal of Physics D |
Abbreviated Journal |
J. Phys. D |
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Volume |
57 |
Issue |
40 |
Pages |
405302 - 9pp |
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Keywords |
dielectrics; secondary electron emission yield; Multipactor in space devices |
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Abstract |
The recent high demand of secondary electron emission yield (SEY) measurements in dielectric materials from space industry has driven SEY laboratories to improve their facilities and measurement techniques. SEY determination by the common capacitive method, also known as pulsed method, is well accepted and has given satisfactory results in most cases. Nevertheless, the samples under study must be prepared according to the experimental limitations of the technique, i.e. they should be manufactured separated from the devices representing faithfully the surface state of the own device and be as thin as possible. A method based on the Kelvin probe (KP) is proposed here to obtain the SEY characteristics of electrically floating Platinum, Kapton and Teflon placed over dielectric spacers with thicknesses ranging from 1.6 to 12.1 mm. The results are compared with those of the capacitive method and indicate that KP SEY curves are less sensitive to spacer thickness. An explanation based on the literature is also given. In all, we have established that KP is better suited for the analysis of dielectric samples thicker than 3 mm. |
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Address |
[Mata, R.; Gimeno, B.] Ciudad Politecn Innovac, Val Space Consortium, Edificio 8G,Acceso B,Planta B, Valencia 46022, Spain, Email: rafael.mata@uv.es |
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Publisher |
IOP Publishing Ltd |
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Language |
English |
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Original Title |
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Series Title |
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Series Volume |
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ISSN |
0022-3727 |
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Notes |
WOS:001269188200001 |
Approved |
no |
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Is ISI |
yes |
International Collaboration |
yes |
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Call Number |
IFIC @ pastor @ |
Serial |
6203 |
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