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Author |
NEXT Collaboration (McDonald, A.D. et al); Alvarez, V.; Benlloch-Rodriguez, J.M.; Carcel, S.; Carrion, J.V.; Diaz, J.; Felkai, R.; Herrero, P.; Kekic, M.; Lopez-March, N.; Martinez-Lema, G.; Muñoz Vidal, J.; Novella, P.; Palmeiro, B.; Perez, J.; Querol, M.; Renner, J.; Romo-Luque, C.; Sorel, M.; Uson, A.; Yahlali, N. |
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Title |
Electron drift and longitudinal diffusion in high pressure xenon-helium gas mixtures |
Type |
Journal Article |
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Year |
2019 |
Publication |
Journal of Instrumentation |
Abbreviated Journal |
J. Instrum. |
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Volume |
14 |
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Pages |
P08009 - 19pp |
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Keywords |
Charge transport and multiplication in gas; Gaseous imaging and tracking detectors |
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Abstract |
We report new measurements of the drift velocity and longitudinal diffusion coefficients of electrons in pure xenon gas and in xenon-helium gas mixtures at 1-9 bar and electric field strengths of 50-300 V/cm. In pure xenon we find excellent agreement with world data at all E/P, for both drift velocity and diffusion coefficients. However, a larger value of the longitudinal diffusion coefficient than theoretical predictions is found at low E/P in pure xenon, below the range of reduced fields usually probed by TPC experiments. A similar effect is observed in xenon-helium gas mixtures at somewhat larger E/P. Drift velocities in xenon-helium mixtures are found to be theoretically well predicted. Although longitudinal diffusion in xenon-helium mixtures is found to be larger than anticipated, extrapolation based on the measured longitudinal diffusion coefficients suggest that the use of helium additives to reduce transverse diffusion in xenon gas remains a promising prospect. |
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Address |
[McDonald, A. D.; Woodruff, K.; Al Atoum, B.; Jones, B. J. P.; Laing, A.; Nygren, D. R.; Rogers, L.] Univ Texas Arlington, Dept Phys, POB 19059, Arlington, TX 76019 USA, Email: austin.mcdonald@uta.edu |
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Publisher |
Iop Publishing Ltd |
Place of Publication |
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Language |
English |
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Original Title |
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Series Title |
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Series Volume |
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Edition |
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ISSN |
1748-0221 |
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Notes |
WOS:000482373600006 |
Approved |
no |
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Is ISI |
yes |
International Collaboration |
yes |
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Call Number |
IFIC @ pastor @ |
Serial |
4118 |
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Permanent link to this record |