| Records |
| Author |
Mata, R.; Cros, A.; Gimeno, B.; Raboso, D. |
| Title |
Secondary electron emission yield in thick dielectric materials: a comparison between Kelvin probe and capacitive methods |
Type |
Journal Article |
| Year |
2024 |
Publication |
Journal of Physics D |
Abbreviated Journal |
J. Phys. D |
| Volume |
57 |
Issue |
40 |
Pages  |
405302 - 9pp |
| Keywords |
dielectrics; secondary electron emission yield; Multipactor in space devices |
| Abstract |
The recent high demand of secondary electron emission yield (SEY) measurements in dielectric materials from space industry has driven SEY laboratories to improve their facilities and measurement techniques. SEY determination by the common capacitive method, also known as pulsed method, is well accepted and has given satisfactory results in most cases. Nevertheless, the samples under study must be prepared according to the experimental limitations of the technique, i.e. they should be manufactured separated from the devices representing faithfully the surface state of the own device and be as thin as possible. A method based on the Kelvin probe (KP) is proposed here to obtain the SEY characteristics of electrically floating Platinum, Kapton and Teflon placed over dielectric spacers with thicknesses ranging from 1.6 to 12.1 mm. The results are compared with those of the capacitive method and indicate that KP SEY curves are less sensitive to spacer thickness. An explanation based on the literature is also given. In all, we have established that KP is better suited for the analysis of dielectric samples thicker than 3 mm. |
| Address |
[Mata, R.; Gimeno, B.] Ciudad Politecn Innovac, Val Space Consortium, Edificio 8G,Acceso B,Planta B, Valencia 46022, Spain, Email: rafael.mata@uv.es |
| Corporate Author |
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Thesis |
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| Publisher |
IOP Publishing Ltd |
Place of Publication |
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Editor |
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| Language |
English |
Summary Language |
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Original Title |
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| Series Editor |
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Series Title |
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Abbreviated Series Title |
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| Series Volume |
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Series Issue |
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Edition |
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| ISSN |
0022-3727 |
ISBN |
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Medium |
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| Area |
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Expedition |
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Conference |
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| Notes |
WOS:001269188200001 |
Approved |
no |
| Is ISI |
yes |
International Collaboration |
yes |
| Call Number |
IFIC @ pastor @ |
Serial |
6203 |
| Permanent link to this record |
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| Author |
Zhang, X.; Xiao, Y.T.; Gimeno, B. |
| Title |
Multipactor Suppression by a Resonant Static Magnetic Field on a Dielectric Surface |
Type |
Journal Article |
| Year |
2020 |
Publication |
IEEE Transactions on Electron Devices |
Abbreviated Journal |
IEEE Trans. Electron Devices |
| Volume |
67 |
Issue |
12 |
Pages |
5723-5728 |
| Keywords |
Radio frequency; Dielectrics; Magnetic resonance; Discharges (electric); Surface discharges; Surface waves; Electrostatics; Monte Carlo simulation; multipactor discharge; orthogonal waves; resonant static magnetic field; secondary electron yield |
| Abstract |
In this article, we study the suppression of the multipactor phenomenon on a dielectric surface by a resonant static magnetic field. A homemade Monte Carlo algorithm is developed for multipactor simulations on a dielectric surface driven by two orthogonal radio frequency (RF) electric field components. When the static magnetic field is perpendicular to the tangential and normal RF electric fields, it is shown that if the normal electric field lags the tangential electric field by pi/2, the superposition of the normal and tangential electric fields will trigger a gyro-acceleration of the electron cloud and restrain the multipactor discharge effectively. By contrast, when the normal electric field is in advance of the tangential electric field by pi/2, the difference between the normal and tangential electric fields drives gyro-motion of the electron cloud. Consequently, two enhanced discharge zones are inevitable. The suppression effects of the resonant static magnetic field that is parallel to the tangential RF electric field or to the normal RF electric field are also presented. |
| Address |
[Zhang, Xue; Xiao, Yuting] Xiangtan Univ, Sch Automat & Elect Informat, Xiangtan 411105, Hunan, Peoples R China, Email: zhangxue.iecas@yahoo.com; |
| Corporate Author |
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Thesis |
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| Publisher |
Ieee-Inst Electrical Electronics Engineers Inc |
Place of Publication |
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Editor |
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| Language |
English |
Summary Language |
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Original Title |
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| Series Editor |
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Series Title |
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Abbreviated Series Title |
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| Series Volume |
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Series Issue |
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Edition |
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| ISSN |
0018-9383 |
ISBN |
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Medium |
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| Area |
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Expedition |
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Conference |
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| Notes |
WOS:000594337700064 |
Approved |
no |
| Is ISI |
yes |
International Collaboration |
yes |
| Call Number |
IFIC @ pastor @ |
Serial |
4627 |
| Permanent link to this record |
