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Author (up) NEXT Collaboration (McDonald, A.D. et al); Alvarez, V.; Benlloch-Rodriguez, J.M.; Botas, A.; Carcel, S.; Carrion, J.V.; Diaz, J.; Felkai, R.; Ferrario, P.; Gomez-Cadenas, J.J.; Laing, A.; Liubarsky, I.; Lopez-March, N.; Martinez, A.; Muñoz Vidal, J.; Musti, M.; Nebot-Guinot, M.; Novella, P.; Palmeiro, B.; Perez, J.; Renner, J.; Rodriguez, J.; Simon, A.; Sofka, C.; Sorel, M.; Torrent, J.; Yahlali, N.
Title Demonstration of Single-Barium-Ion Sensitivity for Neutrinoless Double-Beta Decay Using Single-Molecule Fluorescence Imaging Type Journal Article
Year 2018 Publication Physical Review Letters Abbreviated Journal Phys. Rev. Lett.
Volume 120 Issue 13 Pages 132504 - 6pp
Keywords
Abstract A new method to tag the barium daughter in the double-beta decay of Xe-136 is reported. Using the technique of single molecule fluorescent imaging (SMFI), individual barium dication (Ba++) resolution at a transparent scanning surface is demonstrated. A single-step photobleach confirms the single ion interpretation. Individual ions are localized with superresolution (similar to 2 nm), and detected with a statistical significance of 12.9 sigma over backgrounds. This lays the foundation for a new and potentially background-free neutrinoless double-beta decay technology, based on SMFI coupled to high pressure xenon gas time projection chambers.
Address [McDonald, A. D.; Jones, B. J. P.; Nygren, D. R.; Monrabal, F.; Rogers, L.] Univ Texas Arlington, Dept Phys, POB 19059, Arlington, TX 76019 USA, Email: austin.mcdonald@uta.edu;
Corporate Author Thesis
Publisher Amer Physical Soc Place of Publication Editor
Language English Summary Language Original Title
Series Editor Series Title Abbreviated Series Title
Series Volume Series Issue Edition
ISSN 0031-9007 ISBN Medium
Area Expedition Conference
Notes WOS:000428243400005 Approved no
Is ISI yes International Collaboration yes
Call Number IFIC @ pastor @ Serial 3538
Permanent link to this record
 

 
Author (up) NEXT Collaboration (McDonald, A.D. et al); Alvarez, V.; Benlloch-Rodriguez, J.M.; Carcel, S.; Carrion, J.V.; Diaz, J.; Felkai, R.; Herrero, P.; Kekic, M.; Lopez-March, N.; Martinez-Lema, G.; Muñoz Vidal, J.; Novella, P.; Palmeiro, B.; Perez, J.; Querol, M.; Renner, J.; Romo-Luque, C.; Sorel, M.; Uson, A.; Yahlali, N.
Title Electron drift and longitudinal diffusion in high pressure xenon-helium gas mixtures Type Journal Article
Year 2019 Publication Journal of Instrumentation Abbreviated Journal J. Instrum.
Volume 14 Issue Pages P08009 - 19pp
Keywords Charge transport and multiplication in gas; Gaseous imaging and tracking detectors
Abstract We report new measurements of the drift velocity and longitudinal diffusion coefficients of electrons in pure xenon gas and in xenon-helium gas mixtures at 1-9 bar and electric field strengths of 50-300 V/cm. In pure xenon we find excellent agreement with world data at all E/P, for both drift velocity and diffusion coefficients. However, a larger value of the longitudinal diffusion coefficient than theoretical predictions is found at low E/P in pure xenon, below the range of reduced fields usually probed by TPC experiments. A similar effect is observed in xenon-helium gas mixtures at somewhat larger E/P. Drift velocities in xenon-helium mixtures are found to be theoretically well predicted. Although longitudinal diffusion in xenon-helium mixtures is found to be larger than anticipated, extrapolation based on the measured longitudinal diffusion coefficients suggest that the use of helium additives to reduce transverse diffusion in xenon gas remains a promising prospect.
Address [McDonald, A. D.; Woodruff, K.; Al Atoum, B.; Jones, B. J. P.; Laing, A.; Nygren, D. R.; Rogers, L.] Univ Texas Arlington, Dept Phys, POB 19059, Arlington, TX 76019 USA, Email: austin.mcdonald@uta.edu
Corporate Author Thesis
Publisher Iop Publishing Ltd Place of Publication Editor
Language English Summary Language Original Title
Series Editor Series Title Abbreviated Series Title
Series Volume Series Issue Edition
ISSN 1748-0221 ISBN Medium
Area Expedition Conference
Notes WOS:000482373600006 Approved no
Is ISI yes International Collaboration yes
Call Number IFIC @ pastor @ Serial 4118
Permanent link to this record